Opus Plasma®
A cutting-edge, modern aesthetic platform, new Alma Opus is a high-frequency, unipolar, radiofrequency (RF) technology and the first of its kind. Surpassing the capabilities of the fractional resurfacing lasers of the past, Opus is turning the page for energy-based applications and bridging the gap between skin rejuvenation and an improved overall appearance. As an RF microplasma device, Opus allows for superior customization, permitting the technician to tailor the patient’s results to their needs and aesthetic goals.
Before & After Photos
Frequently Asked Questions
Is Opus similar to skin resurfacing?
Yes and no. Opus is an RF microplasma procedure that gently creates micro-injuries similar to RF microneedling while emitting unipolar radiofrequency energy. The technology is so diverse that it can replicate the results of a gentle chemical peel or the intensity of an aggressive CO2 resurfacing procedure, depending on the patient’s needs.
Will there be a long recovery period after treatment?
Because Opus is so customizable, any associated recovery times will depend on the level of treatment provided by your technician. However, we are finding that potential risks and implications associated with Opus are significantly fewer and more minor than other comparable technological platforms and aesthetic procedures.
How many sessions will I need?
The precise number of sessions you will need for your desired results depends on the treatment plan created by your provider. But in many cases, patients attain impressive results with as little as one session. Your Opus treatment plan will be created following a consultation with a member of our practice to determine the number of sessions you will need for optimal results.
What types of results will I see?
Opus is primarily used for skin tightening and skin resurfacing. Depending on your individual needs and your specific treatment plan, you could attain firmer facial skin, a clearer, more radiant complexion, youthful-looking and feeling skin, and a rested overall appearance.